By Toby Sterling and Nathan Vifflin AMSTERDAM, Jan 27 (Reuters) - As artificial intelligence firms jostle for the Nvidia ...

As earnings season picks up for semiconductor stocks, investors will want to assess which companies might be best positioned ...

Startup Substrate is building next-generation semiconductor fabs using advanced X-ray lithography. This goes beyond extreme ...

Naura Technology, which has been actively acquiring and restructuring since 2015, is gradually assembling a comprehensive supply chain system for domestic semiconductor equipment in China. The most ...

Nvidia has developed a software library for computational lithography, which it believes will massively improve chip design development times, and reduce the number of data centers chip fabs have to ...

ASML Holding N.V.'s core moat—its monopoly on advanced lithography tools—remains unchallenged despite trade uncertainty and cyclical headwinds. Secular demand drivers like AI, automation, and data ...

ASML has announced more plans for a new lithography tool of the fut ure, something that will extend design limits for the very highest transistor-density chips. ASML's former president, Martin van den ...

Intel has completed the assembly of its High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) lithography tool at the company’s R&D site in Hillsboro, Oregon. Built by ASML and delivered in ...

ASML's critical role in semiconductor manufacturing, driven by AI advancements, makes it a key player with significant growth potential, despite geopolitical challenges. Open-source AI models like ...

TL;DR: Intel is expanding its High-NA EUV lithography tool fleet from ASML, ordering two additional machines to advance its next-gen 14A process node. This strategic investment aims to boost Intel's ...

Shri Vaishnaw noted that ASML is the world’s leading provider of lithography tools, enabling the production of almost every advanced semiconductor chip manufactured globally.

Scientists developed a two-photon-enhanced metasurface that cuts photon requirements for nanoscale displacement measurement ...